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Laser-induced chemical deposition from the gas phase

Vladimir Vladimirovich Teslenko
Vladimir Vladimirovich Teslenko
10.1070/RC1990v059n02ABEH003513
Published 30 November 1989
Communication , Volume 59, Issue 2, 103-115
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Teslenko V. V. Laser-induced chemical deposition from the gas phase // Russian Chemical Reviews. 1990. Vol. 59. No. 2. pp. 103-115.
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Teslenko V. V. Laser-induced chemical deposition from the gas phase // Russian Chemical Reviews. 1990. Vol. 59. No. 2. pp. 103-115.
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TY - JOUR
DO - 10.1070/RC1990v059n02ABEH003513
UR - https://rcr.colab.ws/publications/10.1070/RC1990v059n02ABEH003513
TI - Laser-induced chemical deposition from the gas phase
T2 - Russian Chemical Reviews
AU - Teslenko, Vladimir Vladimirovich
PY - 1990
DA - 1989/11/30
PB - ANO Editorial Board of the journal Uspekhi Khimii
SP - 103-115
IS - 2
VL - 59
ER -
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@article{1990_Teslenko,
author = {Vladimir Vladimirovich Teslenko},
title = {Laser-induced chemical deposition from the gas phase},
journal = {Russian Chemical Reviews},
year = {1990},
volume = {59},
publisher = {ANO Editorial Board of the journal Uspekhi Khimii},
month = {Nov},
url = {https://rcr.colab.ws/publications/10.1070/RC1990v059n02ABEH003513},
number = {2},
pages = {103--115},
doi = {10.1070/RC1990v059n02ABEH003513}
}
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Teslenko, Vladimir Vladimirovich. “Laser-induced chemical deposition from the gas phase.” Russian Chemical Reviews, vol. 59, no. 2, Nov. 1990, pp. 103-115. https://rcr.colab.ws/publications/10.1070/RC1990v059n02ABEH003513.
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Abstract

The results of the study of the chemical reactions involved in the deposition of various substances from the gas phase using the pulsed, quasi-continuous, and continuous laser radiation in the wavelength range 0.193–10.6 μm have been summarised. Particular attention has been paid to the deposition of inorganic substances, including non-metals (C, Si, Ge, etc.), metals (Cu, Au, Zn, Cd, Al, Cr, Mo, W, Ni), and a number of simple compounds. Detailed experimental data are given on the influence of the radiation parameters (wavelength, duration and spacing of the pulses, intensity of radiation, shape and position of the laser beam) and the nature of the reagents (hydrides, halides, carbonyls, alkyl organometallic compounds, etc.) on the rate of deposition and the composition of the deposit. The characteristics of photolytic deposition reactions and their possible applications have been examined.
The bibliography contains 202 references.

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