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Processes amplifying the effects of light on polymer layers

Anatolii Veniaminovich Vannikov 1
Anatolii Veniaminovich Vannikov
, 
Antonina Dmitrievna Grishina 1
Antonina Dmitrievna Grishina
1 Frumkin Institute of Electrochemistry, Russian Academy of Sciences
Published 30 November 1992
Communication , Volume 62, Issue 1, 35-49
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Vannikov A. V., Grishina A. D. Processes amplifying the effects of light on polymer layers // Russian Chemical Reviews. 1993. Vol. 62. No. 1. pp. 35-49.
GOST all authors (up to 50)
Vannikov A. V., Grishina A. D. Processes amplifying the effects of light on polymer layers // Russian Chemical Reviews. 1993. Vol. 62. No. 1. pp. 35-49.
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TY - JOUR
DO - 10.1070/RC1993v062n01ABEH000004
UR - https://rcr.colab.ws/publications/10.1070/RC1993v062n01ABEH000004
TI - Processes amplifying the effects of light on polymer layers
T2 - Russian Chemical Reviews
AU - Vannikov, Anatolii Veniaminovich
AU - Grishina, Antonina Dmitrievna
PY - 1993
DA - 1992/11/30
PB - ANO Editorial Board of the journal Uspekhi Khimii
SP - 35-49
IS - 1
VL - 62
ER -
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@article{1993_Vannikov,
author = {Anatolii Veniaminovich Vannikov and Antonina Dmitrievna Grishina},
title = {Processes amplifying the effects of light on polymer layers},
journal = {Russian Chemical Reviews},
year = {1993},
volume = {62},
publisher = {ANO Editorial Board of the journal Uspekhi Khimii},
month = {Nov},
url = {https://rcr.colab.ws/publications/10.1070/RC1993v062n01ABEH000004},
number = {1},
pages = {35--49},
doi = {10.1070/RC1993v062n01ABEH000004}
}
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Vannikov, Anatolii Veniaminovich, and Antonina Dmitrievna Grishina. “Processes amplifying the effects of light on polymer layers.” Russian Chemical Reviews, vol. 62, no. 1, Nov. 1993, pp. 35-49. https://rcr.colab.ws/publications/10.1070/RC1993v062n01ABEH000004.
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Abstract

Processes bringing about amplification of the primary photoeffect in polymer layers through complex formation, autocatalysis, autosensitisation, and acid catalysis are discussed and their practical applications are considered. Attention is concentrated on highly sensitive photoresists for the photolithographic process used in advanced technologies. The bibliography includes 114 references.

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