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Preparation of thin copper films from the vapour phase of volatile copper(I) and copper(II) derivatives by the CVD method

Vladimir Nikiforovich Vertoprakhov 1
Vladimir Nikiforovich Vertoprakhov
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Sergey Alekseevich Krupoder 1
Sergey Alekseevich Krupoder
1 Institute of Inorganic Chemistry, Siberian Branch of the Russian Academy of Sciences, Novosibirsk
10.1070/RC2000v069n12ABEH000572
Published 30 November 1999
Communication , Volume 69, Issue 12, 1057-1082
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Vertoprakhov V. N., Krupoder S. A. Preparation of thin copper films from the vapour phase of volatile copper(I) and copper(II) derivatives by the CVD method // Russian Chemical Reviews. 2000. Vol. 69. No. 12. pp. 1057-1082.
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Vertoprakhov V. N., Krupoder S. A. Preparation of thin copper films from the vapour phase of volatile copper(I) and copper(II) derivatives by the CVD method // Russian Chemical Reviews. 2000. Vol. 69. No. 12. pp. 1057-1082.
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TY - JOUR
DO - 10.1070/RC2000v069n12ABEH000572
UR - https://rcr.colab.ws/publications/10.1070/RC2000v069n12ABEH000572
TI - Preparation of thin copper films from the vapour phase of volatile copper(I) and copper(II) derivatives by the CVD method
T2 - Russian Chemical Reviews
AU - Vertoprakhov, Vladimir Nikiforovich
AU - Krupoder, Sergey Alekseevich
PY - 2000
DA - 1999/11/30
PB - ANO Editorial Board of the journal Uspekhi Khimii
SP - 1057-1082
IS - 12
VL - 69
ER -
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@article{2000_Vertoprakhov,
author = {Vladimir Nikiforovich Vertoprakhov and Sergey Alekseevich Krupoder},
title = {Preparation of thin copper films from the vapour phase of volatile copper(I) and copper(II) derivatives by the CVD method},
journal = {Russian Chemical Reviews},
year = {2000},
volume = {69},
publisher = {ANO Editorial Board of the journal Uspekhi Khimii},
month = {Nov},
url = {https://rcr.colab.ws/publications/10.1070/RC2000v069n12ABEH000572},
number = {12},
pages = {1057--1082},
doi = {10.1070/RC2000v069n12ABEH000572}
}
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Vertoprakhov, Vladimir Nikiforovich, and Sergey Alekseevich Krupoder. “Preparation of thin copper films from the vapour phase of volatile copper(I) and copper(II) derivatives by the CVD method.” Russian Chemical Reviews, vol. 69, no. 12, Nov. 2000, pp. 1057-1082. https://rcr.colab.ws/publications/10.1070/RC2000v069n12ABEH000572.
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Abstract

The main chemical aspects of the preparation of thin copper films from the vapour of monovalent and divalent copper derivatives as precursors in the CVD technique are considered. Data on the methods of synthesis and the properties of various types of these compounds are generalised and described systematically. The possible decomposition mechanisms of copper compounds under CVD conditions are discussed. The prospects of using the CVD technology for the preparation of thin copper films in integrated circuits of microelectronic devices are outlined. The bibliography includes 432 references.

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