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Oxide ferroelectric thin films: synthesis from organometallic compounds and properties

Vladimir Nikiforovich Vertoprakhov 1
Vladimir Nikiforovich Vertoprakhov
, 
Lyubov' Dmitrievna Nikulina 1
Lyubov' Dmitrievna Nikulina
, 
Igor Konstantinovich Igumenov 1
Igor Konstantinovich Igumenov
1 Nikolaev Institute of Inorganic Chemistry, Siberian Branch of the Russian Academy of Sciences, Novosibirsk
10.1070/RC2005v074n08ABEH000924
Published 30 November 2004
Communication , Volume 74, Issue 8, 725-746
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Vertoprakhov V. N., Nikulina L. D., Igumenov I. K. Oxide ferroelectric thin films: synthesis from organometallic compounds and properties // Russian Chemical Reviews. 2005. Vol. 74. No. 8. pp. 725-746.
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Vertoprakhov V. N., Nikulina L. D., Igumenov I. K. Oxide ferroelectric thin films: synthesis from organometallic compounds and properties // Russian Chemical Reviews. 2005. Vol. 74. No. 8. pp. 725-746.
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TY - JOUR
DO - 10.1070/RC2005v074n08ABEH000924
UR - https://rcr.colab.ws/publications/10.1070/RC2005v074n08ABEH000924
TI - Oxide ferroelectric thin films: synthesis from organometallic compounds and properties
T2 - Russian Chemical Reviews
AU - Vertoprakhov, Vladimir Nikiforovich
AU - Nikulina, Lyubov' Dmitrievna
AU - Igumenov, Igor Konstantinovich
PY - 2005
DA - 2004/11/30
PB - ANO Editorial Board of the journal Uspekhi Khimii
SP - 725-746
IS - 8
VL - 74
ER -
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@article{2005_Vertoprakhov,
author = {Vladimir Nikiforovich Vertoprakhov and Lyubov' Dmitrievna Nikulina and Igor Konstantinovich Igumenov},
title = {Oxide ferroelectric thin films: synthesis from organometallic compounds and properties},
journal = {Russian Chemical Reviews},
year = {2005},
volume = {74},
publisher = {ANO Editorial Board of the journal Uspekhi Khimii},
month = {Nov},
url = {https://rcr.colab.ws/publications/10.1070/RC2005v074n08ABEH000924},
number = {8},
pages = {725--746},
doi = {10.1070/RC2005v074n08ABEH000924}
}
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Vertoprakhov, Vladimir Nikiforovich, et al. “Oxide ferroelectric thin films: synthesis from organometallic compounds and properties.” Russian Chemical Reviews, vol. 74, no. 8, Nov. 2005, pp. 725-746. https://rcr.colab.ws/publications/10.1070/RC2005v074n08ABEH000924.
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Abstract

Chemical methods for the preparation of oxide ferroelectric thin films from organometallic compounds published over the last 10–15 years are considered systematically and generalised. Layers of these films are promising for the creation of non-volatile memory elements and for use in nano- and microelectronic devices.