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Activation of solid-phase processes by radiation of gas-discharge lamps

Valentin Mikhailovich Ievlev 1
Valentin Mikhailovich Ievlev
1 Voronezh State Technical University
Published 30 November 2012
Communication , Volume 82, Issue 9, 815-834
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Ievlev V. M. Activation of solid-phase processes by radiation of gas-discharge lamps // Russian Chemical Reviews. 2013. Vol. 82. No. 9. pp. 815-834.
GOST all authors (up to 50)
Ievlev V. M. Activation of solid-phase processes by radiation of gas-discharge lamps // Russian Chemical Reviews. 2013. Vol. 82. No. 9. pp. 815-834.
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RIS
TY - JOUR
DO - 10.1070/RC2013v082n09ABEH004357
UR - https://rcr.colab.ws/publications/10.1070/RC2013v082n09ABEH004357
TI - Activation of solid-phase processes by radiation of gas-discharge lamps
T2 - Russian Chemical Reviews
AU - Ievlev, Valentin Mikhailovich
PY - 2013
DA - 2012/11/30
PB - ANO Editorial Board of the journal Uspekhi Khimii
SP - 815-834
IS - 9
VL - 82
ER -
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@article{2013_Ievlev,
author = {Valentin Mikhailovich Ievlev},
title = {Activation of solid-phase processes by radiation of gas-discharge lamps},
journal = {Russian Chemical Reviews},
year = {2013},
volume = {82},
publisher = {ANO Editorial Board of the journal Uspekhi Khimii},
month = {Nov},
url = {https://rcr.colab.ws/publications/10.1070/RC2013v082n09ABEH004357},
number = {9},
pages = {815--834},
doi = {10.1070/RC2013v082n09ABEH004357}
}
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Cite this
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Ievlev, Valentin Mikhailovich. “Activation of solid-phase processes by radiation of gas-discharge lamps.” Russian Chemical Reviews, vol. 82, no. 9, Nov. 2013, pp. 815-834. https://rcr.colab.ws/publications/10.1070/RC2013v082n09ABEH004357.
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Abstract

Results of studies on application of broadband radiation of gas-discharge lamps for activation of solid-phase processes including the synthesis of thin films, nanocrystallization of amorphous structures, recrystallization and modification of thin films formed by various methods are analyzed and generalized. Compared to conventional thermal processing, the effect of photon treatment manifests itself in acceleration of processes, higher degree of dispersion of structures formed and in reduction of temperature thresholds for the phase formation. Prospects for application of photon activation in technological processes are discussed.

The bibliography includes 142 references.

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