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Chemical vapour-phase deposition of ruthenium-containing thin films

Vladislav Yur'evich Vasilev 1, 2
Vladislav Yur'evich Vasilev
, 
Natal'ya Borisovna Morozova 3
Natal'ya Borisovna Morozova
, 
Igor Konstantinovich Igumenov 3
Igor Konstantinovich Igumenov
1 Novosibirsk State Technical University
2 'SibIS', Limited Liability Company, Novosibirsk, Russia
3 Nikolaev Institute of Inorganic Chemistry, Siberian Branch of the Russian Academy of Sciences, Novosibirsk
10.1070/RC2014v083n08ABEH004402
Published 30 November 2013
Communication , Volume 83, Issue 8, 758-782
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Vasilev V. Y., Morozova N. B., Igumenov I. K. Chemical vapour-phase deposition of ruthenium-containing thin films // Russian Chemical Reviews. 2014. Vol. 83. No. 8. pp. 758-782.
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Vasilev V. Y., Morozova N. B., Igumenov I. K. Chemical vapour-phase deposition of ruthenium-containing thin films // Russian Chemical Reviews. 2014. Vol. 83. No. 8. pp. 758-782.
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TY - JOUR
DO - 10.1070/RC2014v083n08ABEH004402
UR - https://rcr.colab.ws/publications/10.1070/RC2014v083n08ABEH004402
TI - Chemical vapour-phase deposition of ruthenium-containing thin films
T2 - Russian Chemical Reviews
AU - Vasilev, Vladislav Yur'evich
AU - Morozova, Natal'ya Borisovna
AU - Igumenov, Igor Konstantinovich
PY - 2014
DA - 2013/11/30
PB - ANO Editorial Board of the journal Uspekhi Khimii
SP - 758-782
IS - 8
VL - 83
ER -
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@article{2014_Vasilev,
author = {Vladislav Yur'evich Vasilev and Natal'ya Borisovna Morozova and Igor Konstantinovich Igumenov},
title = {Chemical vapour-phase deposition of ruthenium-containing thin films},
journal = {Russian Chemical Reviews},
year = {2014},
volume = {83},
publisher = {ANO Editorial Board of the journal Uspekhi Khimii},
month = {Nov},
url = {https://rcr.colab.ws/publications/10.1070/RC2014v083n08ABEH004402},
number = {8},
pages = {758--782},
doi = {10.1070/RC2014v083n08ABEH004402}
}
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Vasilev, Vladislav Yur'evich, et al. “Chemical vapour-phase deposition of ruthenium-containing thin films.” Russian Chemical Reviews, vol. 83, no. 8, Nov. 2014, pp. 758-782. https://rcr.colab.ws/publications/10.1070/RC2014v083n08ABEH004402.
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Abstract

Chemical and materials science aspects of formation of ruthenium-containing thin films for modern high-precision technologies by chemical vapour deposition (CVD) methods are considered. Chemical approaches to the synthesis of main precursors used in MOCVD techniques, layer growth processes as well as main physicochemical and electrical properties of ruthenium-containing thin films are analyzed.

Bibliography --- 120 references.

References

1.
Properties of RuO x Working Electrodes in Nonaqueous Solvents
Rolison D.R., Kuo K., Umana M., Brundage D., Murray R.W.
Journal of the Electrochemical Society , 1979
2.
Ru and RuO2 as Electrical Contact Materials: Preparation and Environmental Interactions
Vadimsky R.G., Frankenthal R.P., Thompson D.E.
Journal of the Electrochemical Society , 1979
3.
3
M. F. Shostakovskii
"Prostye Vinilovye Efiry" (Vinyl Ethers) , 1952
4.
4
A. A. Krasnovskii
Dokl. Akad. Nauk SSSR , 1949
5.
Electrical properties of Ru-based alloy gate electrodes for dual metal gate Si-CMOS
Misra V., Huicai Zhong, Lazar H.
IEEE Electron Device Letters , 2002
6.
6
V. B. Evstigneev
Dokl. Akad. Nauk SSSR , 1953
7.
Atomic Layer Deposition of Ruthenium Thin Films for Copper Glue Layer
Kwon O., Kim J., Park H., Kang S.
Journal of the Electrochemical Society , 2004
9.
Growth of high-density Ru- and RuO2-composite nanodots on atomic-layer-deposited Al2O3 film
Chen W., Zhang M., Zhang D.W., Ding S., Tan J.-., Xu M., Qu X., Wang L.-.
Applied Surface Science , 2007
10.
10
T. A. Kryukova
"Polyaro-graficheskii Analiz" (Polarographic Analysis) , 1959
11.
Ruthenium/aerogel nanocomposites via atomic layer deposition
Biener J., Baumann T.F., Wang Y., Nelson E.J., Kucheyev S.O., Hamza A.V., Kemell M., Ritala M., Leskelä M.
Nanotechnology , 2007
12.
Sputtered Ruthenium as a Contact Material for Sealed Reeds
Augis J., Hines L.
IEEE Transactions on Components Hybrids and Manufacturing Technology , 1978
13.
13
V. B. Evstigneev
Dokl. Akad. Nauk SSSR , 1954
14.
Deposition and Properties of Reactively Sputtered Ruthenium Dioxide Films
Sakiyama K., Onishi S., Ishihara K., Orita K., Kajiyama T., Hosoda N., Hara T.
Journal of the Electrochemical Society , 1993
16.
16
A. A. Krasnovskii
Dokl. Akad. Nauk SSSR , 1949
18.
18
A. A. Krasnovskii
Dokl. Akad. Nauk SSSR , 1951
19.
19
A. A. Krasnovskii
Dokl. Akad. Nauk SSSR , 1959
20.
Chemical vapour deposition of thin-film dielectrics
Vasilev V.Y., Repinsky S.M.
Russian Chemical Reviews , 2005
21.
21
A. A. Krasnovskii
Dokl. Akad. Nauk SSSR , 1958
22.
Ruthenium Thin Films Grown by Atomic Layer Deposition
Aaltonen T., Alén P., Ritala M., Leskelä M.
Chemical Vapor Deposition , 2003
23.
Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films
Kwon O., Kwon S., Park H., Kang S.
Electrochemical and Solid-State Letters , 2004
24.
PEALD of a Ruthenium Adhesion Layer for Copper Interconnects
Kwon O., Kwon S., Park H., Kang S.
Journal of the Electrochemical Society , 2004
26.
Enhanced Nucleation Behavior of Atomic-Layer-Deposited Ru Film on Low-k Dielectrics Afforded by UV-O[sub 3] Treatment
Heo J., Lee S.Y., Eom D., Hwang C.S., Kim H.J.
Electrochemical and Solid-State Letters , 2007
27.
Improved Nucleation Behavior of Ru Thin Films Prepared by MOCVD on TiCl[sub 4] Pretreated Substrates
Kim B.S., Kang S.Y., Seo H.S., Hwang C.S., Kim H.J.
Electrochemical and Solid-State Letters , 2007
28.
28
A. A. Krasnovskii
Dokl. Akad. Nauk SSSR , 1955
29.
A Ru(II) η3-Allylic Complex as a Novel Precursor for the CVD of Ru- and RuO2-Nanostructured Thin Films
Barreca D., Buchberger A., Daolio S., Depero L.E., Fabrizio M., Morandini F., Rizzi G.A., Sangaletti L., Tondello E.
Langmuir , 1999
30.
30
V. B. Evstigneev
Dokl. Akad. Nauk SSSR , 1954
31.
31
A. A. Krasnovskii
Biokhimiya , 1960
32.
32
A. A. Krasnovskii
Dokl. Akad. Nauk SSSR , 1952
34.
34
G. W. Robinson
J. Chem. Phys. , 1886
35.
35
Z. K. Maizus
Dokl. Akad. Nauk SSSR , 1960
36.
36
J. Billon
Bull. Soc. chim. France , 1960
37.
37
L. M. Kosobutskaya
Dokl. Akad. Nauk SSSR , 1950
38.
Surface Selective Growth of Ruthenium Films under Low-Temperature Pulsed CVD Conditions
Vasilyev V.Y., Mogilnikov K.P., Song Y.W.
Electrochemical and Solid-State Letters , 2008
39.
Nucleation and Growth of Pulsed CVD Ru Films from Tricarbonyl[η[sup 4]-cyclohexa-1,3-diene]ruthenium
Vasilyev V.Y., Mogilnikov K.P., Song Y.W.
Journal of the Electrochemical Society , 2008
42.
42
L. K. Obukhova
Izv. Akad. Nauk SSSR, Otd. Khim. Nauk , 1960
44.
44
V. B. Evstigneev
Dokl. Akad. Nauk SSSR , 1953
46.
46
V. B. Evstigneev
Dokl. Akad. Nauk SSSR , 1955
48.
48
A. A. Krasnovskii
Dokl. Akad. Nauk SSSR , 1955
50.
50
G. Glacomello
Gazzetta. , 1935
52.
Evaluation of precursors for chemical vapor deposition of ruthenium
Smith K.C., Sun Y.-., Mettlach N.R., Hance R.L., White J.M.
Thin Solid Films , 2000
53.
Growth of Ru/RuO2 layers with atomic vapor deposition on plain wafers and into trench structures
Manke C., Boissière O., Weber U., Barbar G., Baumann P.K., Lindner J., Tapajna M., Fröhlich K.
Microelectronic Engineering , 2006
54.
Approach to control deposition of ultra thin films from metal organic precursors: Ru deposition
Igumenov I.K., Semyannikov P.P., Trubin S.V., Morozova N.B., Gelfond N.V., Mischenko A.V., Norman J.A.
Surface and Coatings Technology , 2007
55.
Ruthenium Films Prepared by Liquid Source Metalorganic Chemical Vapor Deposition Using Ru(dpm)3 Dissolved with Tetrahydrofuran Solvent
Kadoshima M., Nabatame T., Hiratani M., Nakamura Y., Asano I., Suzuki T.
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes , 2002
56.
56
T. Iasui
Bull. Chem. Soc. Japan. , 1935
57.
Ruthenium films by digital chemical vapor deposition: Selectivity, nanostructure, and work function
Dey S.K., Goswami J., Gu D., de Waard H., Marcus S., Werkhoven C.
Applied Physics Letters , 2004
58.
Atomic Layer Deposition of Ruthenium Thin Films from Ru(thd)3 and Oxygen
Aaltonen T., Ritala M., Arstila K., Keinonen J., Leskelä M.
Chemical Vapor Deposition , 2004
59.
Ultra-Thin Ruthenium Films by Pulsed Chemical Vapor Deposition
Hendrix B.C., Welch J.J., Roeder J.F., Wang Z., Xu C., Stawasz M., Baum T.
ECS Transactions , 2007
61.
Reaction Mechanism Studies on Atomic Layer Deposition of Ruthenium and Platinum
Aaltonen T., Rahtu A., Ritala M., Leskelä M.
Electrochemical and Solid-State Letters , 2003
62.
Atomic layer deposition of noble metals: Exploration of the low limit of the deposition temperature
Aaltonen T., Ritala M., Tung Y., Chi Y., Arstila K., Meinander K., Leskelä M.
Journal of Materials Research , 2004
65.
Effect oxygen exposure on the quality of atomic layer deposition of ruthenium from bis(cyclopentadienyl)ruthenium and oxygen
Park S., Kim W., Maeng W.J., Yang Y.S., Park C.G., Kim H., Lee K., Jung S., Seong W.K.
Thin Solid Films , 2008
66.
Metallorganic Chemical Vapor Deposition of Ru Films Using Cyclopentadienyl-Propylcyclopentadienylruthenium(II) and Oxygen
Kang S.Y., Lim H.J., Hwang C.S., Kim H.J.
Journal of the Electrochemical Society , 2002
67.
Improvements in Growth Behavior of CVD Ru Films on Film Substrates for Memory Capacitor Integration
Kang S.Y., Hwang C.S., Kim H.J.
Journal of the Electrochemical Society , 2004
69.
Growth Mechanism of Ru Films Prepared by Chemical Vapor Deposition Using Bis(ethylcyclopentadienyl)ruthenium Precursor
Matsui Y., Hiratani M., Nabatame T., Shimamoto Y., Kimura S.
Electrochemical and Solid-State Letters , 2002
70.
Characteristics of Ruthenium Films Prepared by Chemical Vapor Deposition Using Bis(ethylcyclopentadienyl)ruthenium Precursor
Matsui Y., Hiratani M., Nabatame T., Shimamoto Y., Kimura S.
Electrochemical and Solid-State Letters , 2002
71.
Chemical vapor deposition of ruthenium and ruthenium oxide thin films for advanced complementary metal-oxide semiconductor gate electrode applications
Papadatos F., Consiglio S., Skordas S., Eisenbraun E.T., Kaloyeros A.E., Peck J., Thompson D., Hoover C.
Journal of Materials Research , 2004
72.
Liquid delivery MOCVD of Ruthenium Films from Ru(EtCp)2 with Toluene Solvent
Lisker M., Hur'yeva T., Burte E.
ECS Transactions , 2007
73.
Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
Yim S., Lee D., Kim K., Lee M., Kim S., Kim K.
Electrochemical and Solid-State Letters , 2008
74.
Ruthenium Film with High Nuclear Density Deposited by MOCVD Using a Novel Liquid Precursor
Shibutami T., Kawano K., Oshima N., Yokoyama S., Funakubo H.
Electrochemical and Solid-State Letters , 2003
75.
Seed Layer Free Conformal Ruthenium Film Deposition on Hole Substrates by MOCVD Using (2,4-Dimethylpentadienyl)(ethylcyclopentadienyl)ruthenium
Kawano K., Nagai A., Kosuge H., Shibutami T., Oshima N., Funakubo H.
Electrochemical and Solid-State Letters , 2006
76.
Atomic Layer Deposition of Ru Thin Films Using 2,4-(Dimethylpentadienyl)(ethylcyclopentadienyl)Ru by a Liquid Injection System
Kim S.K., Lee S.Y., Lee S.W., Hwang G.W., Hwang C.S., Lee J.W., Jeong J.
Journal of the Electrochemical Society , 2007
77.
Low-Temperature Preparation of Metallic Ruthenium Films by MOCVD Using Bis(2,4-dimethylpentadienyl)ruthenium
Kawano K., Kosuge H., Oshima N., Funakubo H.
Electrochemical and Solid-State Letters , 2007
78.
The Effect of Precursor Ligands on the Deposition Characteristics of Ru Films by MOCVD
Kawano K., Kosuge H., Oshima N., Funakubo H.
Electrochemical and Solid-State Letters , 2009
79.
A new RuO4 solvent solution for pure ruthenium film depositions
Gatineau J., Yanagita K., Dussarrat C.
Microelectronic Engineering , 2006
80.
Pulsed-Chemical Vapor Deposition of Ruthenium and Ruthenium Dioxide Thin Films using RuO4 Precursor for the DRAM Capacitor Electrode
Han J.H., Lee S.W., Choi G.J., Lee S.Y., Hwang C.S., Dussarrat C., Gatineau J.
ECS Transactions , 2009
82.
Vapor Deposition of Ruthenium from an Amidinate Precursor
Li H., Farmer D.B., Gordon R.G., Lin Y., Vlassak J.
Journal of the Electrochemical Society , 2007
83.
83
A. A. Krasnovskii
Dokl. Akad. Nauk SSSR , 1947
84.
Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O[sub 2]
Eom T., Sari W., Choi K., Shin W., Kim J.H., Lee D., Kim K., Sohn H., Kim S.
Electrochemical and Solid-State Letters , 2009
86.
86
V. B. Evstigneev
Dokl. Akad. Nauk SSSR , 1958
87.
87
J. F. Arens
"Advances in Organic Chemistry" , 1960
88.
88
A. A. Krasnovskii
Dokl. Akad. Nauk SSSR , 1946
89.
In situ mass spectrometry during thermal CVD of the tris-acetylacetonates of 3-d transition metals
Semyannikov P.P., Igumenov I.K., Trubin S.V., Asanov I.P.
Journal de Physique IV (Proceedings) , 2007
90.
Synthesis, crystal structure and thermal behavior of dimethylgold(III) derivatives of salicylaldimine Schiff bases – Novel precursors for gold MOCVD applications
Bessonov A.A., Morozova N.B., Gelfond N.V., Semyannikov P.P., Baidina I.A., Trubin S.V., Shevtsov Y.V., Igumenov I.K.
Journal of Organometallic Chemistry , 2008
91.
Investigation of thermal properties of ruthenium(III) Β-diketonate precursors for preparation of RuO2 films by CVD
Bykov A.F., Morozova N.B., Igumenov I.K., Sysoev S.V.
Journal of Thermal Analysis and Calorimetry , 1996
93.
93
V. B. Evstigneev
Dokl. Akad. Nauk SSSR , 1956
94.
94
A. A. Krasnovskii
Fiziologiya Rastenii , 1957
97.
The absorption spectra and magnetic properties of the chelated compounds of Ru(III) with β-diketones
Grobelny R., Jeowska-Trzebiatowska B., Wojciechowski W.
Journal of Inorganic and Nuclear Chemistry , 1966
101.
Crystal Structure of Iridium(III) trans-Trifluoroacetylacetonate
Zherikova K.V., Kuratieva N.V., Baidina I.A., Morozova N.B.
Journal of Structural Chemistry , 2010
102.
102
F. Fichter
Helv. Chim. Acta , 1922
103.
Volatile β-diketonato Complexes of Ruthenium, Palladium and Platinum. Preparation and Thermal Characterization
Lashdaf M., Hatanpää T., Tiitta M.
Journal of Thermal Analysis and Calorimetry , 2001
106.
Study of temperature dependencies of saturated vapor pressure of ruthenium(III) beta-diketonate derivatives
Morozova N.B., Zherikova K.V., Semyannikov P.P., Trubin S.V., Igumenov I.K.
Journal of Thermal Analysis and Calorimetry , 2009
108.
108
F. Fichter
Helv. Chim. Acta , 1924
110.
Crucial role of Ru⋯H interactions in the crystal packing of ruthenocene and its derivatives
Borissova A.O., Antipin M.Y., Perekalin D.S., Lyssenko K.A.
CrystEngComm , 2008
111.
111
M. Calvin
1956
113.
A new synthetic method for the preparation of cyclo-olefin ruthenium complexes
Pertici P., Vitulli G., Paci M., Porri L.
Journal of the Chemical Society Dalton Transactions , 1980
115.
New models of heat and mass exchange of gas in nanopores
Golovnev I.F., Golovneva E.I., Fomin V.M., Kuchumov B.M., Igumenov I.K.
Doklady Physics , 2013
116.
116
V. B. Evstigneev
Dokl. Akad. Nauk SSSR , 1957
117.
Growth, microstructure, and resistivity of RuO2 thin films grown by metal-organic chemical vapor deposition
Vetrone J., Foster C.M., Bai G., Wang A., Patel J., Wu X.
Journal of Materials Research , 1998
118.
Preparation of high quality RuO2 electrodes for high dielectric thin films by low pressure metal organic chemical vapor deposition
Lee J.M., Shin J.C., Hwang C.S., Kim H.J., Suk C.
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films , 1998
120.
Metallorganic Chemical Vapor Deposition of Ru and RuO2 Using Ruthenocene Precursor and Oxygen Gas
Park S., Kim H., Kim K., Min S.
Journal of the Electrochemical Society , 2002
121.
Chemical Vapor Deposited RuO[sub x] Films
Ganesan P.G., Eizenberg M., Dornfest C.
Journal of the Electrochemical Society , 2002
122.
Chemical vapor deposited RuOx films: interfacial adhesion study
Ganesan P.G., Eizenberg M.
Materials Science and Engineering B: Solid-State Materials for Advanced Technology , 2003
123.
123
V. V. Levchenko
Zhur. Obshch. Khim. , 1952
124.
Selective Vapor Deposition of Hydrous RuO[sub 2] Thin Films
Swider-Lyons K.E., Love C.T., Rolison D.R.
Journal of the Electrochemical Society , 2005
125.
Thin-film ruthenium dioxide coatings via ozone-mediated chemical vapor deposition
Hashaikeh R., Butler I.S., Kozinski J.A.
Thin Solid Films , 2006
126.
Conformability of Ruthenium Dioxide Films Prepared on Substrates with Capacitor Holes by MOCVD and Modification by Annealing
Kawano K., Kosuge H., Oshima N., Funakubo H.
Electrochemical and Solid-State Letters , 2006
127.
Application of Ru-based gate materials for CMOS technology
T˘apajna M., Písec˘ny P., Lupták R., Hus˘eková K., Fröhlich K., Harmatha L., Hooker J.C., Roozeboom F., Jergel J.
Materials Science in Semiconductor Processing , 2004
128.
Pt-Doped Ru Films Prepared by CVD as Electrodes for DRAM Capacitors
Kang S.Y., No S.Y., Choi J., Hwang C.S., Kim H.J.
Electrochemical and Solid-State Letters , 2004
129.
Chemical vapor deposition of amorphous ruthenium–phosphorus alloy films
Shin J., Waheed A., Winkenwerder W.A., Kim H., Agapiou K., Jones R.A., Hwang G.S., Ekerdt J.G.
Thin Solid Films , 2007